The Quality and Reliability of Intel’s Quarter Micron Process
نویسندگان
چکیده
This paper describes how the quality and reliability of Intel’s products are designed, measured, modeled, and maintained. Four main reliability topics: ESD protection, electromigration, gate oxide wearout, and the modeling and management of mechanical stresses are discussed. Based on an analysis of the reliability implications of device scaling (the process of a planned reduction of dimensions and operating parameters), we show how these four topics are of prime importance to component reliability. We conclude with a brief discussion of the future challenges of energy scaling.
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تاریخ انتشار 1998